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Realized resistance heritability and resistance risk of Spodoptera exigua tocyhalothrin,fenvalerate and alpha-cypermethrin

LAN Yiquan;ZHAO Shixi;WU Gang   

  1. College of Plant Protection,Fujian Agriculture and Forestry University,Fuzhou 350002,China

  • Received:2005-03-14 Revised:2005-07-18 Online:2006-03-18 Published:2006-03-18

Abstract: In this paper,Spodoptera exigua from Fuzhou of Fujian Province was continuously selected and bred to test its resistance to cyhalothrin,fenvalerate and alpha-cypermethrin,and to evaluate its realized resistance heritability (h2) and resistance risk.The results showed that after 12,10,and 10 generations,the resistance of S.exigua to cyhalothrin,fenvalerate and alpha-cypermethrin was increased by 18.1,27.6,and 45.4 fold,and the realized resistance heritability was 0.2567,0.3571 and 0.4239,respectively.Assuming that the h2 of field S.exigua population was half of these values,it required 9~20 generations for cyhalothrin,6~14 generations for fenvalerate,and 5~12 generations for alpha-cypermethrin to obtain 10-fold increase in resistance under selective pressure of 50%~90% mortality for each selective generation.Of the three pyrethroids,the resistance risk to cyhalothrin was smaller than that to fenvalerate and alpha-cypermethrin.

Key words: Artificial oases, Potential pattern, Actual pattern